Nanometer-scale scanning sensors fabricated using stencil lithography

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We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.
Original languageEnglish
JournalApplied Physics Letters
Volume82
Issue number7
Pages (from-to)1111
Number of pages3
ISSN0003-6951
DOIs
Publication statusPublished - 1 Jan 2003
Externally publishedYes

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